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Heat treatment equipment
Vacuum tray furnace for graphite disc
Product introduction: Vacuum baking pan furnace is a furnace body used in conjunction with MOCVD equipment. The furnace is vacuumed, and the processed work piece is placed in the furnace. Dry cleaning is carried out by using a cleaning gas heating reaction method (cleaning gas: N2, H2). It is mainly used to effectively remove gallium nitride and aluminum nitride on MOCVD susceptor (SiC coated graphite disk or quartz disk), which can achieve effective cleaning treatment and improve product quality.
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Vacuum tray furnace for graphite disc
Product introduction: Vacuum baking pan furnace is a furnace body used in conjunction with MOCVD equipment. The furnace is vacuumed, and the processed work piece is placed in the furnace. Dry cleaning is carried out by using a cleaning gas heating reaction method (cleaning gas: N2, H2). It is mainly used to effectively remove gallium nitride and aluminum nitride on MOCVD susceptor (SiC coated graphite disk or quartz disk), which can achieve effective cleaning treatment and improve product quality.
Device appearance:
Cooling system
1. The rear door is designed with hot air motor
2. When the temperature is lowered, the fan is turned on, and at the same time, the cooling heads at both ends are opened, and the gas flow direction as shown in the furnace is generated.
3. Heat exchange between the heat insulation layer and the water wall through the gas medium to achieve rapid cooling
Technical parameters and basic configuration:
Use temperature: 1450 ° C;
Maximum temperature: 1500 ° C;
Heating zone size: Φ1050×1040mm (D×L);
Studio size: 710 × 710 × 1000mm (W × H × L);
Insulation material: graphite fiber blanket, graphite paper;
Muffle material: SUS304;
Heating element: graphite heating rod;
Cooling method: air cooling + circulating air cooling and cooling;
Temperature control stability: ± 2 ° C, with PID parameter self-tuning function;
Furnace temperature uniformity: ± 5 ° C (constant temperature 1550 ° C);
Temperature control thermocouple: WRe5;
Temperature control points: 1 point;
Monitoring points: 1 point
Atmosphere: Dry, clean and oil-free high-purity nitrogen can be introduced into the furnace with purity ≥99.999%;
Ultimate vacuum: 10-3torr level;
Pumping rate: under no load, reach 10-2torr in 30min
Alarm protection: sound and light alarm protection such as over temperature, break even, stop gas;
Maximum heating power: 120kW;
Power supply: capacity greater than 160KVA, 3-phase 5-wire, 220/380VAC, 50Hz;
Maximum heating rate: 15 ° C / min (no load);
Cooling rate: 1450 ° C to 80 ° C, 240 minutes
Outer color of the device: computer toned gray;
Installation size: 2300mm × 2000mm × 2500mm (W × H × D)
Product introduction: Vacuum baking pan furnace is a furnace body used in conjunction with MOCVD equipment. The furnace is vacuumed, and the processed work piece is placed in the furnace. Dry cleaning is carried out by using a cleaning gas heating reaction method (cleaning gas: N2, H2). It is mainly used to effectively remove gallium nitride and aluminum nitride on MOCVD susceptor (SiC coated graphite disk or quartz disk), which can achieve effective cleaning treatment and improve product quality.
Product introduction: Vacuum baking pan furnace is a furnace body used in conjunction with MOCVD equipment. The furnace is vacuumed, and the processed work piece is placed in the furnace. Dry cleaning is carried out by using a cleaning gas heating reaction method (cleaning gas: N2, H2). It is mainly used to effectively remove gallium nitride and aluminum nitride on MOCVD susceptor (SiC coated graphite disk or quartz disk), which can achieve effective cleaning treatment and improve product quality.
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